UPS

5mbar XPS/UPS system [project 522]

System dedicated for XPS (ESCA)/UPS experiments in pressure range 5 mbar - 10-10 mbar with controllable sample temperature. Equipment provides full PLC protection and software control including clear visualization of the machine state, data acquisition, control of all integrated devices, power supplies and ancillary.

• Analysis chamber - made of μ-metal, with connecting flanges for current and further equipment. Base pressure range 10^-10 mbar (after bakeout at 120 ºC),
• EA15-HP5 hemispherical energy analyser (XPS/UPS) - equipped with a total number of 11 slits, the analyzer offers the possibility to choose between best energy resolution and best intensity. Mean radius: 150 mm.
• X-ray source RS 40B1 (HP version) - high intensity twin anode X-ray source,
• X-ray source with monochromator RMC50 (HP version) with electronic set (emission controller, cooling box and HV power supply for operating both RMC50 and RS40B1 X-ray source),
• UV source UVS 40A2,
• RUDI-EA2 - high stable and low noise electronics,
• SPECTRIUM - a progressive and optimized software tool in regard of handling and intuitive graphical interface,
• 4-axes, full motorised UHV manipulator (with heating & LN₂ cooling) for PTS sample holders,
• Pumping system for analysis chamber, HP analyser and analytical components,
• Gas dosing system for the analysis chamber.

High Pressure | Ambient Pressure XPS (ESCA) / UPS system [project 296]

Discription

Dedicated system for ambient pressure 1 mbar – 10-10 mbar XPS (ESCA) / UPS experiments with controllable sample temperature from 100 K to 850 K in analysis chamber. Full PLC protection and software control including a clear visualisation of machine state. Data acquisition and control of all integrated devices, supplies and ancillary equipment.

• Ambient pressure chamber 1 mbar – 10^-10 mbar
• Equipped with HP analyser
• Differentially pumped X-ray monochromator
• Differentially pumped double anode X-ray source
• Differentially pumped UV source
• Four pumping stages for main chamber and analyser
• Integral halogen bakeout of analytical chamber
• Laser and resistive heating of sample holder
• Wide range of sample temperature: 100 K - 2200 K
• Sample preparation chamber
• High pressure reactor - up to 20 bar, 650°C
• Gas dosing system with ability of heating and thermal stabilisation
• Intro with preliminary heating
• Sample park chamber which allows storage up to 5 sample holders
• TDS sample measurement during XPS (ESCA) / UPS in ambient pressure

XPS UPS Photoelectron Spectrometer [project 454]

Discription

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.

Specification

The system designed for investigations and modifications of solid surfaces by XPS/UPS methods under very well controlled conditions. The base pressure in the analytical chambers is < 5*10-11 mbar.

• Multifunctional analytical chamber integrates different measurement methods like standard ESCA, AES, ISS and UPS. A high precision, 5 axes manipulator ensures very good positioning of the sample and it is equipped with cryostat for LN₂ and a heater for cooling and heating of the sample in a very wide temperature range. The chamber is made from mu metal, equipped with hemispherical analyzer and analytical equipment as ion source, electron source, flood gun, monochromatic X-ray source, no monochromatic X-ray sorce, UV source and prepared for many others. The equipment can be modified according to the customer demands.
• Two levels preparation chamber, equipped with LEED, TDS, ion source, electron beam evaporator, mechanical surface cleaner, and many ports which can be used for future preparation or evaporation devices. The temperature on the sample depends on the sample holders and can vary from -180°C to 2000°C.
• Distribution Chamber for transferring sample holders to particular chambers connected on its circumference.
• Cleaver chamber for cleaving the samples mounted in suitable sample holder.
• High pressure chamber for heating up to 650°C and cooling the sample in controlled gas atmosphere under pressure to 2 MPa
• Load lock chamber prepared for dust samples pumping, with internal bakeout system.
• Sample park chamber for 6 sample holders.

High resolution UPS and XPS system [project 317]

Discription

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges by different methods under very well controlled conditions.

Specification

The system designed for investigations and modifications of solid surfaces by XPS/UPS methods under very well controlled conditions. The base pressure in the analytical chambers is < 5*10-11 mbar.

• Multifunctional analytical chamber integrates different measurement methods like standard ESCA, AES, ISS and UPS. A high precision, 4 axes manipulator ensures very good positioning of the sample and it is equipped with cryostat for LN₂ and a heater for cooling and heating of the sample in a very wide temperature range. The chamber is made from mu metal, equipped with hemispherical analyzer and analytical equipment as ion source, electron source, flood gun, monochromatic X-ray source, UV source and prepared for many others. The equipment can be modified according to the customer demands.
• Two levels preparation chamber, equipped with LEED, TDS, ion source, electron beam evaporator, mechanical surface cleaner, and many ports which can be used for future preparation or evaporation devices. The temperature on the sample depends on the sample holders and can vary from -180°C to 2000°C.
• Load lock chamber prepared for dust samples pumping, with internal bakeout system.

Multichamber XPS/UPS system for catalyst research [project 010]

Discription

A custom multi-chamber UHV system for the investigation of physical and chemical properties of novel catalyst materials.

Specification

Multi-chamber (analytical and preparation) system with linear sample transport between chambers under true UHV conditions (pressure lower than 10-10 mbar). The base pressure in the analytical chambers is < 5*10-11 mbar. Catalytic reactions can be performed at pressures up to and including 2000 mbar with rapid pump down and transfer to the analysis chamber.

• Spherical multi technique analytical chamber integra­ting different surface analysis methods: Monochro­matic X-ray Photoelectron Spectroscopy (MXPS), Mo­nochromatic Ultraviolet Photoelectron Spectroscopy (UPS) and Photoelectron Emission Microscopy (PEEM). Sample positioning is via a very stable, high precision, 5-axis manipulator with two rotational axes motorised for automatic angular mapping. The sample receiving station is equipped with a LN₂ cryostat that allows tem­perature variation over the range -180°C to 1000°C (dependent on sample holder model). The chamber is fabricated from mu-metal and equipped with a hemi­spherical analyzer with 2D detector, a monochromatic X-ray source, UV source, monochromator, and a 40 nm resolution PEEM
• UHV vacuum  system with combination of maglev turbo molecular pumps, ion pumps and titanium sublimation pumps. Surface analytical chamber and preparation chambers can be baked independently. The hemispherical analyzer is mounted in a horizontal position
• Spherical preparation chamber mounted above the analysis chamber is equipped with ion source, mass spectrometer, electron beam evaporator, gas doser and several ports for future expansion
• High pressure reactor for sample heating (up to 650°C) and cooling in controlled gas atmospheres at pressures up to 2000 mbar
• Sample park chamber for 6 sample holders
• Load lock chamber