There are two models to choose from; 100mm diameter and 150mm diameter plasma chamber. Either choice is perfect for occasional and low-throughput laboratory or production use. They do not have the range of options or upgrade features available with our other plasma cleaner models but deliver unbeatable value in a compact, bench-top unit.
Our plasma cleaner/plasma asher range for electron microscopy are fully automated bench-top plasma cleaners that come with standard adapters which are suitable for the sample holders supplied with all the major microscope manufacturers. The plasma output power is fully variable over the range 0-100W, resulting in a very controllable & gentle cleaning process. Common sources of error inside the microscope are clearly reduced with plasma cleaning and the dwell time during the measurement is significantly increased.
Plasma cleaning glass, metals & ceramics components is rapidly displacing time consuming, hit and miss, solvent and aqueous based cleaning methods. For this industry in particular; inefficient wet chemical procedures ultimately lead to higher costs and reduced yield and even prolonged treatments can be ineffective in removing seemingly insignificant trace levels of organic contaminants that can ultimately affect how fit for purpose a particular component is.
New legislation will also restrict the use of environmentally unfriendly chemicals in addition to e.g. trichloroethylene. Plasma cleaning offers significant advantages over wet cleaning methods alone and can enable a leading market position for those adopting it early.
Organic contamination which may be present on all lens surfaces is typically only a few nanometres thick but it is sufficient to alter optical properties. Plasma cleaning of optics & lenses is performed with oxygen gas, or sometimes even lab air is sufficient, in a few 10’s of seconds and with no chemical waste. Unlike solvent cleaners, plasma cleaning leaves absolutely no residue.
Plasma cleaning of gas permeable contact lenses is now widely used to improve surface wettability characteristics which result in increased comfort for longer and also inhibits deposits. The effects of the plasma can last for many weeks
Established PCB Manufacture can incorporate our user friendly & cost-effective cleaning processes easily and efficiently. Our plasma cleaning machines feature multiple loading racks that ensure excellent uniformity across the PCB, between PCB’s and from process to process.
In many electronics application areas, there is a stringent requirement for ultra-clean bond pads prior to wire bonding. This is especially true in e.g. semiconductor and space satellite instrumentation fabrication. Wire bond pad contamination results in poor bond pull strength and also bond strength uniformity. Plasma cleaning may be applied as an in-line solution e.g. prior to encapsulation, or as a batch processing step with bespoke frame loading arrangements.
Several important factors influence film deposition, including viscosity of the deposited solution and spin speed for example. Surface wettability also plays an important role and can be controlled with routine plasma cleaning of the substrate prior to deposition. Henniker’s HPT-100 and HPT-200 bench-top plasma systems are widely used for this purpose to achieve clean, contamination free substrates prior to spin coating.
Our range of plasma cleaners are available with various options, such as single or multiple gas inlets, multiple loading trays and rotary drum chambers, making them suitable for many requirements. Our experts have years of experience with different applications and system options and will help you to configure a unit for your exact needs. If you are looking for a robust, trusted plasma cleaner, our range should provide an excellent starting point.
Our range of plasma coating systems are available with options such as multiple loading trays, rotary drum chambers and powder handling facilities. We have a wealth of real-world experience in coatings processes and our experts are on hand to provide advice and support for any given application. Our plasma process library is extensive and we are always happy to discuss and provide real-world examples of water repellent coatings, permanently hydrophilic coatings, low friction coatings and other specific functional plasma coatings.
Chemical plasma etching is used to ‘roughen’ a surface on the microscopic scale. The surface of the component is etched with a reactive process gas. Material is precisely sputtered off, converted to the gas phase and sucked away via the vacuum system. The surface area is greatly increased, making the material easily wettable. Etching is used before printing, gluing and painting and is particularly useful for processing of e.g. POM and PTFE, which cannot otherwise be printed on or bonded.
Physical etching or reactive ion etching, delivers a highly directional flux of energetic, reactive ions to the material surface. In doing so, a precisely controlled patterning of the substrate occurs as un-masked sample is etched away by the reactive ions. Each of our plasma systems can optionally be fitted with a reactive ion etch electrode making them a perfect, low-cost laboratory development tool in applications such as semiconductor or organic electronics research.
The TEM sample plasma cleaners / plasma ashers are fully automated and comes with standard adapters which are suitable for the sample holders supplied with all the major microscope manufacturers. The plasma output power is fully variable over the range 0-100W, resulting in a very controllable & gentle cleaning process. Common sources of error inside the TEM are clearly reduced with plasma cleaning and the dwell time during the measurement is significantly increased
The NEBULA range has been designed around our core technologies in plasma surface treatment and plasma process development. With chamber volumes ranging from 50L to 150L, each instrument may be configured with multiple parts tray/electrodes for either horizontal or vertical mounting arrangements. Additionally, a high capacity rotary drum mechanism can be chosen for the treatment of large numbers of small parts for example.
NEBULA plasma systems are used for cleaning, adhesion improvement and enhanced wetting of surfaces via plasma surface activation. Treatments can be performed equally on metals, polymers, composites, glass and ceramics.
A unique feature of each NEBULA system is the addition of an optional monomer dosing inlet. This is a fully automated device for the introduction of a wide range of liquid monomers to produce permanently functionalised surfaces via plasma polymerisation, greatly extending the range of plasma surface treatment possibilities in a single machine.