X-Ray Photoelectron Spectroscopy & ESCA

XPS system [project 212]

Description

Analytical chamber designed for X-ray photoelectron spectroscopy (XPS), integrated with multichamber vacuum system for thin film deposition.

System configuration

• Analytical chamber from mu-metal with sublimation pump andoptional TMP
• 5-axis manipulator
• Detector XPS/UPS/ARPES
• X-ray source with monochromator
• UV source
• Electron source
• Ion source
• Mapping
• Distribution chamber with TMP pumping system
• Load Lock chamber
• Storage chamber
• Bake-out system
• Cabinet for all electronics
• Software

Scanning XPS system [project 279]

Description

The UHV ESCA system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.

Specification

• The system designed for investigations and modifications of solid surfaces by XPS/UPS methods under very well controlled conditions. The base pressure in the analytical chambers is < 5*10-11 mbar.
• Multifunctional analytical chamber integrates different measurement methods like standard ESCA, AES, ISS and UPS. A high precision, 4 axes manipulator ensures very good positioning of the sample and it is equipped with cryostat for LN2 and a heater for cooling and heating of the sample in a very wide temperature range. The temperature range depends on the sample holders and can vary from -180°C to 2000°C. The chamber is made from mu metal, equipped with hemispherical analyzer and analytical equipment as ion source, electron source, flood gun, monochromatic X-ray source, UV source and prepared for many others. The equipment can be modified according to the customer demands.
• Load lock chamber prepared for dust samples pumping, with internal bakeout system.
• Sample park chamber for 6 sample holders.

Multichamber XPS UHV system [project 097]

Description

Multichamber UHV system dedicated to surface analysis of solid and powder samples by electron spectroscopy techniques:

• X-ray Photoelectron Spectroscopy (XPS)
• Ultraviolet Photoemission Spectroscopy (UPS)
• Auger Electron Spectroscopy (AES)
• Scanning Probe Microscopy (SPM)
• Low Energy Electron Diffraction (LEED)
• Temperature Programmed Desorption (TPD)
• Solution allow to have one sample holder type in all chambers.

The system consists of:

• Spectroscopy chamber with analyzer (incl. instrumentation and software) which allows to use XPS, UPS, AES, EPS techniques. The analyzer enable XPS measurement with high resolution, precise and depth profiling on selected surface <= 1x1mm, possibility of chemical imaging and angular-resolved measurement
• Variable temperature STM/AFM chamber with instrumentation and software which is dedicated to atomic resolution measurements
• Preparation chamber dedicated to preparing samples, equipped with AES/LEED spectrometer and thermal desorption spectrometer with residual gas analyzer (incl. instrumentation and software). Moreover is equipped with thermal and electron bombardment sources for thin film production scrapping tool and ion source for surface cleaning. The chamber is equipped with manipulator XYZ,
• Rotation tilt which allow to cool the samples down to 90°K and heat the samples to2200°K.

Moreover the system is equipped with:

Sample loading, transferring and storage system, Equipment for sample preparing and cleaning. UHV Flow Through High Pressure Reactor. Gas dosing system, pressure and temperature measurement and control system, vacuum controlling system. Sample temperature measurement and control system. Sample loading, prepare for UHV suitcase using, Unique Radial Distribution Chamber system with extremely easy handling solution. Storage chamber with heating and cooling possibilities. High pressure reactor for thermal / pressure processes in range up to 20 bar and 650°C. Solution with extremely short time heating in high pressure and UHV.

Multichamber ESCA UHV system [project 053]

Description

Customized multi chamber UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.

Specification

Multi-chamber system designed for investigations and modifications of solid surfaces by different methods under very well controlled conditions. Central radial distribution chamber with attached analytical chambers and auxiliary chambers fulfill these demands and ensure high quality measurement because the samples are transferred between chambers under UHV pressures (<10-10mbar). The base pressure in the analytical chambers is < 5*10-11 mbar.

• The system designed for investigations and modifications of solid surfaces by XPS/UPS methods under very well controlled conditions. The base pressure in the analytical chambers is < 5*10-11 mbar.
• Multifunctional analytical chamber integrates different measurement methods like standard ESCA, ESCA with lateral resolution < 9μ, AES, ISS and UPS. A high precision, 5 axes manipulator ensures very good positioning of the sample and it is equipped with cryostat for LN2 and a heater for cooling and heating of the sample in a very wide temperature range. The temperature range depends on the sample holders and can vary from -180°C to 2000°C. The chamber is made from mu metal, equipped with hemispherical analyzer and analytical equipment as ion source, electron source, flood gun, X-ray source and prepared for many others. The equipment can be modified according to the customer demands.
• Variable temperature STM/AFM chamber is mounted on a concrete plate located on a separate frame with a vibration isolation system. The distribution chamber transfer system allows the samples holders to be placed directly in to the STM/AFM receiving station in the same way as manipulators located in others chambers. The chamber is equipped with an electron beam evaporator which can work during the measurements. The chamber has own magazine part for tips and samples, with tip heating station and suitable wobble stick for transportation between the magazine and the STM receiving station.
• Three levels preparation chamber, equipped with LEED, TDS, ion source, electron beam evaporator, mechanical surface cleaner, and many ports which can be used for future preparation or evaporation devices.
• Load lock chamber prepared for dust samples pumping, with internal bakeout system.
• Cleaver chamber for cleaving the samples mounted in suitable sample holder.
• High pressure chamber for heating up to 650°C and cooling the sample in controlled gas atmosphere under pressure to 2 MPa
• Sample park chamber for 6 sample holders.
• To minimize the vibration during AFM/STM measurement all mechanical pumps can be turned off and the vacuum in the system is generated by ion pumps and titanium sublimation pumps only.

Multifunctional ESCA system [project 125]

Description

Customized multi chamber UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperature and pressure ranges.

Specification

• Multi-chamber system designed for investigations and modifications of solid surfaces by different methods under very well controlled conditions. Central radial distribution chamber with attached analytical chambers and auxiliary chambers fulfill these demands and ensure high quality measurement because the samples are transferred between chambers under UHV pressures (<10-10mbar). The base pressure in the analytical chambers is < 5*10-11 mbar.
• Multifunctional analytical chamber integrates different measurement methods like standard ESCA, ESCA, AES, ISS and UPS. A high precision, 5 axes manipulator ensures very good positioning of the sample and it is equipped with cryostat for LN2 and a heater for cooling and heating of the sample in a very wide temperature range. The temperature range depends on the sample holders and can vary from -180°C to 2000°C. The chamber is made from mu metal, equipped with hemispherical analyzer and analytical equipment as ion source, electron source, flood gun, X-ray source, Monochromatic X-ray source and prepared for many others. The equipment can be modified according to the customer demands.
• Two levels preparation chamber, equipped with LEED, TDS, ion source, electron beam evaporator, mechanical surface cleaner, and many ports which can be used for future preparation or evaporation devices.
• Distribution Chamber for transferring sample holders to particular chambers connected on its circumference.
• Load lock chamber prepared for dust samples pumping, with internal bakeout system.
• High pressure chamber for heating up to 650°C and cooling the sample in controlled gas atmosphere under pressure to 2 MPa
• Sample park chamber for 6 sample holders.

XPS/ESCA analytical UHV system [project 111]

Description

A analytical UHV system HV system dedicated for investigation of the chemical and physical properties of solid state surfaces in wide temperatures and UHV conditions.

Specification

• Analytical system with linear sample transport between chambers (analysis and load lock) under true UHV conditions. The base pressure in the analytical chamber is < 5*10-11 mbar. System is prepared to future extensions about radial distribution chamber with possibilities add another process chambers like: preparation, reactor or deposition chamber.
• Spherical multi technique analytical chamber integrating different surface analysis methods: X-ray Photoelectron Spectroscopy (XPS), Mo­nochromatic Ultraviolet Photoelectron Spectroscopy (UPS). Sample positioning is via a very stable, high precision, 5-axis manipulator with two rotational axes motorised for automatic angular mapping. The sample receiving station is equipped with a LN2 cryostat that allows tem­perature variation over the range -180°C to 1000°C (dependent on sample holder model). The chamber is fabricated from mu-metal and equipped with a hemi­spherical analyzer with 2D detector, X-ray source, Ion source for depth profiling, Flood source,
• UHV vacuum system with combination of maglev turbo molecular pumps, ion pump and titanium sublimation pumps. The hemispherical analyzer is mounted in azimuthal position,
• Load lock chamber.

Ultra High Resolution Photoemission Spectrometer [project 351]

A analytical UHV system dedicated for investigation of the chemical and physical properties of solid state surfaces in low temperatures and UHV conditions.

Transferring system:

Mini PTS Sample holder.

System configuration:

- Analysis chamber with base pressure range 5*10-11 mbar include:

• Close cycle 5-axis high resolution manipulator with LHe cooling (temperature on the sample down to 13K) – full motorized
• High performance electron analyzer XPS/UPS/ARPES
• Monochromatic X-ray source for XPS measurement
• Monochromatic UV source with dedicated pumping system for UPS measurement.
• Additional free port for other components

- Load Lock chamber allows loading up to 5 miniPTS sample holder

- Two-level Preparation chamber equipped with:

• High precision 4-axis manipulator with LN2 cooling and EB heating up to 1200°C
• Ion sputter source for sample cleaning
• Deposition rate measurement system: Quartz Balance and Thickness monitor
• Electron Beam Evaporator
• LEED for Leed /Auger measurement
• Additional free ports for other components in future

- Storage Chamber including park mechanism for six miniPTS sample holders

- Radial distribution chamber (UFO) for transferring the samples are transferred between chambers under UHV pressures

- Accessories:

• Set of dedicated, multifunctional, multimaterial sample holders
• Special rack for all electronics unit
• Special design bakeout system
• Chiller
• Tool kits

High Pressure Photoemission Spectroscopy UHV System [project 487]

It is quipped with a HP analyser but the focus is on a highly flexible sample environment, partly in form of a newly developed, highly versatile, gas cell, partly in form of the possibility of replacing the analysis chamber with a completely different chamber setup. The station will thus allow for frontier research on gas-solid and gas-liquid interactions. The system is equipped with automated control features to allow for safe and efficient operation of many different types of samples by many different operators.

The heart of the system is the analysis module that is based on the high pressure analyser and a gas cell concept designed by PREVAC.

HP cell 3-axes manipulator design allows for sample heating by IR laser illumination (the sample temperature over 800 °C is reachable within the cell), resistive heating (up to 700 °C) and LN2 cooling (with double Z axes: one for gas cell proper placement and second for high precise sample positioning). For easy disconnection from the gas cell chamber, the manipulator is mounted on the rails.

▪ Ambient pressure 50 mbar - 10^-10 mbar
▪ Highly flexible sample environment
▪ Innovative, versatile gas cell
▪ Easy HP cell manipulator dissasembly
▪ Easy analyser module dissasembly
▪ Easy operation
▪ For gas-solid and gas-liquid interactions

▪ Ambient pressure 50 mbar - 10^-10 mbar
▪ Highly flexible sample environment
▪ Innovative, versatile gas cell
▪ Easy HP cell manipulator dissasembly
▪ Easy analyser module dissasembly
▪ Easy operation
▪ For gas-solid and gas-liquid interactions

Scanning XPS system [project 279]

Discription

Multitechnique IR-UHV system offering a wide range of surface characterisation techniques, including:

• X-Ray Photoelectron Spectroscopy (XPS),
• Ultraviolet Photoelectron Spectroscopy (UPS)
• Angle-Resolved Photoemission Spectroscopy (ARPES)

The setup is optimized for Infrared (IR)-spectroscopy, it is the first UHV-system on the market allowing to record data using IR reflection-absorption spectroscopy (IRRAS) on dielectric substrates (oxides, nitrides) in a routine fashion.

A flexible sample holder with integrated heating allows for the application of a variety of sample preparation procedures. A sample transfer system and two radial distribution chambers offer a maximum of flexibility.

• FT-IRRAS for wide range of sample temperatures: 28 K - 2200 K (depending on sample holder) - 28 K are reached in less than 15 min
• Separate sample preparation chamber equipped with a low energy electron diffraction (LEED) system
• Multitechnique analysis chamber with high-performance electron-energy analyzer R4000
• High-performance Vertex 80v IR spectrometer