The manipulators are used for manipulating sample holders and scientific tools with respect to a sample’s position. These manipulators, when combined with sample holders, allow precise placement and manipulation of samples in UHV environments. Manipulator equipment is designed to be modular for convenience and to achieve total flexibility. The individual modules, such as the Z Slide, XY Stage, rotary feedthroughs and motorization modules are compatible to allow complex applications to be built up from a range of simple units.
Drive-m, our control unit, is about the size of a shoebox and offers a complete functional MRI scanner for educational NMR and MRI experiments.
Created with state of the art electronics, the control unit contains a built-in gradient and RF amplifiers.
It is prepared to heat the substrate up to 1400°C (EB heating, UHV conditions) with accuracy +/- 1°C. The station includes the substrate (standard up to 6 inch sample holder) positioner and allows precise angular position of substrate in relation to linear shutter.
Applications
The 1-2 axes motorised MBE manipulator is designed for MBE applications under ultra-high vacuum conditions. Heating is performed by resistive or EB methods. The manipulator can work in the vertical orientation.
Manipulator for MBE applications:
▪ sample holders: generally plate style
▪ prepared for reaching high temperature
▪ base pressure: 10-11 mbar
Option
▪ H2O shroud
▪ LN2 or H2O cooling
▪ side or integrated wedge shutter (possible with H2O cooling option)
▪ XY movement stage
▪ shutter on/off
Standard base flange | DN 100CF to DN 300CF (depending on the sample size, other on request) |
Base pressure range | 10-11 mbar |
Shutter | integrated or external, pneumatic or manual |
Heating methods | resistive, EB |
Substrate temperature | up to 1200 °C (resistive) up to 1400 °C (EB) |
Cooling method | LN2, H20 |
Z range | 50 mm (other on request) |
positional control | handwheel/motorised* |
resolution (manual/motorised) | 500 μm / standard 10 μm |
R1 range | 360° continuous |
positional control | motorised* |
XY range (option) |
± 12.5 mm |
positional control | micrometer/motorised* |
resolution (manual/motorised) | 5 μm / 1 μm |
Max speed | up to 60 rpm |
Bakeout temperature | up to 150 °C / 200 °C (on request) |
* stepper motor or servomotor - depend on application.
Manipulator can be prepared for customer motors or drivers - on request.
It is prepared to heat the substrate up to 1000°C with accuracy +/- 1°C. The station includes the substrate (standard up to 6 inch sample holder) positioner and allows precise angular position of substrate in relation to linear shutter.
Applications
The 1-4 axes motorised sputtering manipulator is designed for sputter deposition applications under ultra-high vacuum conditions, and for reactive sputtering. Heating is performed by resistive method. The manipulator can work in the vertical orientation.
Manipulator for sputtering applications:
▪ sample holders: plate style, PTS
▪ base pressure: 10-9 mbar (working pressure: ~10-2 mbar)
Heater materials
The heater material is optimally adapted depending on the customer's requirements and the specific conditions of the deposition process (e.g. heating temperature, presence of reactive gases). Exemplary heaters: thermocoax, graphite coated with SiC, SiC solid (β).
Option
▪ H2O cooling
▪ side or integrated wedge shutter
▪ XY movement stage
▪ BIAS, DC ,RF
Standard base flange | DN 100CF, DN 160CF, DN 200CF or DN 250CF |
Base pressure range | 10-9 mbar |
Shutter | integrated or external, pneumatic or manual |
Heating methods | resistive, EB, direct |
Substrate temperature | up to 1000 °C |
Cooling method | H20 |
Z range | 50 mm (other on request) |
positional control | handwheel/motorised* |
resolution (manual/motorised) | 500 μm / standard 10 μm (1 μm on request) |
R1 range | 360° continuous |
positional control | motorised* |
XY range (option) |
± 12.5 mm |
positional control | micrometer/motorised* |
resolution (manual/motorised) | 5 μm / 1 μm |
Max speed | up to 60 rpm (other on request) |
Bakeout temperature | up to 150 °C |
* stepper motor or servomotor - depend on application.
Manipulator can be prepared for customer motors or drivers - on request.
The target manipulator has two axes of rotation - R1 and R2: by changing the position of R1, different targets are selected. The R2 axis has a continuous rotation around its own axis. The manipulator has additional hole/position (between two targets) to accommodate a laser power meter. The XY motion module allows scanning of the target via laser beam. One axis is motorised - for scanning, second is manual - for adjusting. Additional Z axis is used to set up transfer position for target transferring via Load Lock Chamber. The Z movement can be motorised or manual. Computer controls the target rotation and radial scanning over the complete target diameter (fixed laser beam) for making multi-layer deposition with maximum target usage.
Applications
The 1-4 axes motorised PLD target manipulator is designed for pulsed laser deposition applications under ultra-high vacuum conditions. The manipulator can work in vertical or horizontal orientation, depends on PLD process geometry.
Manipulator for PLD applications:
▪ two manipulators: for substrate and target
▪ substrate holders: plate style, PTS, flag style
▪ base pressure: 10-10 mbar
Additional information
▪ possibility of fixing targets with irregular shapes,
▪ target sizes: 1 ", 2", standard target thickness: 0.5 - 10 mm,
▪ continuous, individual rotation of targets,
▪ select and sequence change of targets,
▪ shield against mutual pollution of targets,
▪ radial scan, automatic control,
▪ target is mounted coaxially (relative to the substrate) and positioned so as to eliminate the likelihood of droplets, clusters settling on the substrate and the effects of possible target peeling,
▪ target holders are transferable to the load-lock chamber (or storage) for quick replacement,
▪ water cooling system.
Standard base flange | DN 100CF or DN 200CF |
Base pressure range | 10-11 mbar |
Shutter | integrated, pneumatic |
Cooling method | H20 |
R2 range | 360° continuous |
positional control | motorised* |
resolution (motorised) | 0.1° |
Z range | 50 mm (other on request) |
positional control | handwheel |
resolution (manual/motorised) | 500 μm / standard 10 μm (1 μm on request) |
XY range (option) |
± 12.5 mm |
positional control | micrometer/motorised* |
resolution (manual/motorised) | 5 μm / 1 μm |
Max speed | up to 50 rpm (other on request) |
Bakeout temperature | up to 150 °C |
* stepper motor or servomotor - depend on application.
Manipulator can be prepared for customer motors or drivers - on request.
For easy disconnection from the gas cell chamber, the manipulator is mounted on the rails. HP cell manipulator design allows for sample heating by IR laser illumination (the sample temperature over 800 °C is reachable within the cell), resistive heating (up to 700 °C) and LN2 cooling.
Both axes are fitted with vernier readouts of 0.1° precision and provides full 360° R1 rotation in the horizontal plane (with no sources hindering the movement) and up to 90° R3 tilt from vertically upward pointing to horizontal. Stepper motor controller with external panel and computer interface.
The goniometer’s head permits precision sample positioning and alignment motion at the sample location. Installation of a goniometer head enables rotations, translations and flip movements with various accuracies. Sample faces can be held on axis, allowing a single sample site to be investigated during a change of angle.
The goniometer is fabricated entirely from UHV compatible materials, has anti-backlash spring-loaded gearing, and can also be fitted with heating, cooling and sample transfer options.
Reasearch table can travel along the XYZ axes, rotate around Z axis, as well as tilt in relation to two orthogonal directions in the +/- 3° range. The second Z movement is possible for additional precise sample positioning while experiment. It is equipped with temperature monitoring system. These manipulators are configured with an inclinometer as standard.
All manipulators are motorised and software controlled. Shutters are available with or without water cooling. Surfaces can be coated with a fluorescent material. Different material and shapes available according to requirements.
Slit unit manipulators kinematic data | |||
Manipulator | Axis | Range | Resolution |
Photodiode | Z | ± 25 mm | ≤ 10 μm |
HES shutter | Z | ± 6 mm | ≤ 0.5 μm |
VES shutter | Z | ± 0.5 mm | ≤ 0.5 μm |
Chamber shift along the beamline | Z | ± 100 mm | ≤ 50 μm |
Vacuum mirror chambers are situated along the synchrotron beam line. Mirrors are located inside the chamber and mounted on a vibration isolated special holder which is moved using a multi-axis manipulator in order to determine the correct direction of the beam.
VERTICAL WEDGE STAGE
Very rigid, motorised vertical axis stage for e.g. positioning the grating chamber.
Z stroke: ± 10 mm
Resolution: 5 μm
Mirror manipulator kinematic data | ||
Example for cylindrical focusing mirror | ||
Axis | Range | Resolution |
X | ± 10 mm | ≤ 10 μm |
Z | ± 10 mm | ≤ 10 μm |
X' | ± 10 mRad | ≤ 0.5 μRad |
Y' | ± 10 mRad | ≤ 0.5 μRad |
Z' | ± 10 mRad | ≤ 0.5 μRad |
Z" | ± 15 mm | ≤ 10 μm |
The standard mounting flange is DN 160CF. A DN 100CF mounting flange version is also available. The stage can work in any orientation.
Application
The XY stages has been designed for ease and convenience of use. X and Y movement are ± 25.0 mm, depending on the accessories that are fitted. They can also be used to reposition a chamber port with an axis that is parallel to, but slightly off, the desired direction. In this last usage it is sometimes referred to as an XY adjuster and is a very economical alternative to other devices.
Base flange | DN 100CF or DN 160CF |
Travelling flange | DN 63CF or DN 100CF |
Max free diameter | 102 mm |
X, Y range | ± 12.5 mm or ± 25 mm |
positional control | micrometer / stepper motor (option) |
resolution (manual/motorised) | 5 μm / 1 μm |
Bakeout temperature | up to 150 °C |
MAXIMUM XY RANGES
Base flange | Travelling flange | Ø B [mm] | X,Y range [mm] real stroke (circle) |
X,Y range [mm] real stroke (square) |
DN 100CF | DN 63CF | Ø 38 | ± 25 | ± 17.5 |
DN 100CF | DN 100CF | Ø 62 | ± 12.5 | ± 9 |
DN 160CF | DN 63CF | Ø 38 | ± 25 | ± 17.5 |
DN 160CF | DN 100CF | Ø 75 | ± 25 | ± 17.5 |
XY Stage DN 160/100CF ranges (example)
(ØA-ØB)/2 = real stroke (circle) | Ø B [mm] | ||
Ø 50 | Ø 80 | Ø 100 | |
DN 160/100CF XY ± 12.5 mm mounting flange bore ØA=125 mm |
± 12.5 | ± 12.5 | ± 12.5 |
DN 160/100CF XY ± 25.0 mm mounting flange bore ØA=125 mm |
± 25 | ± 22.5 | ± 12.5 |
DN 160/100CF XY ± 25.0 mm mounting flange bore ØA=152 mm |
± 25 | ± 25 | ± 25 |
The travelling flange can be chosen depending on the type of accessories. The translator is suitable for vertical or horizontal mounting.
Application
The Z slides have been designed for ease and convenience of use. Z movement is 75 - 800 mm, depending on application. These translators provide greater linear travel than is available from the linear shifts.
Additional information
The Z slides are mostly used together with XY stages. After combining the Z slide with an XY stage we get the XYZ stage with three degrees of freedom. The Z slide can also be fitted with a stepper motor as required.
Standard base flange | DN 40CF, DN 63CF or DN 100CF |
Standard travelling flange | DN 40CF, DN 63CF or DN 100CF |
Z range | 75 - 800 mm (standard, other on request) |
Z motion control | handwheel / stepper motor (option) |
resolution (manual/motorised) | 500 μm / standard 10 μm (1 μm on request) |
Bakeout temperature | up to 150 °C |
COMPRESSED / EXTENDED LENGTH
Z range [mm] |
Bellow ID39 | Bellow ID65 | Bellow ID102 | ||
DN 40/40CF | DN63/40CF DN100/40CF |
DN63/63CF | DN100/63CF | DN100/100CF | |
75 | 142 / 217 | 148.5 / 223.5 | 211 / 286 | ||
100 | 142 / 242 | 148.5 / 248.5 | 211 / 311 | ||
150 | 142 / 292 | 148.5 / 298.5 | 211 / 361 | ||
200 | 142 / 342 | 148.5 / 348.5 | 211 / 411 | ||
250 | 142 / 392 | 148.5 / 398.5 | 211 / 461 | ||
300 | 142 / 442 | 148.5 / 448.5 | 211 / 511 | ||
350 | 207 / 557 | 213.5 / 563.5 | 211 / 561 | ||
400 | 207 / 607 | 213.5 / 613.5 | 211 / 611 | ||
450 | 207 / 657 | 213.5 / 663.5 | 211 / 661 | ||
500 | 207 / 707 | 213.5 / 713.5 | 211 / 711 | ||
600 | 272 / 872 | 278.5 / 878.5 | 276 / 876 | ||
700 | 272 / 972 | 278.5 / 978.5 | 276 / 976 | ||
800 | 272 / 1072 | 278.5 / 1078.5 | 276 / 1076 |
Integration with XY stage (through a common bellows) is recommended for best motion range. Module geometry is customized in order to maintain the radius of rotation around the focus point and other customer requirements. The R2/R3 rotation can be motorised or manual.
Application
The R2/R3 tilt module has been designed to achieve the best angular resolution, thanks to a large radius of rotation.
In addition the rigid design allows attachment of heavy loads to the end-effector. Another advantage of this solution is the lack of mechanical parts on the vacuum side. The functionality can be extended by changing the arrangement of chosen modules (R2 tilt, R3 tilt, R1 rotation, XY stage, Z slide).
Base flange | DN 160CF |
Travelling flange | DN 100CF, DN 63CF |
R3 range | ± 3° |
R3 motion control | handwheel / stepper motor (option) |
resolution (manual/motorised) | 0.1° / 0.01° |
Bakeout temperature | up to 150 °C |
The feedthrough has two stages of differential pumping isolated by graphite-impregnated, expanded viton seals on special sealing surfaces. A pre-loaded ball bearing set accurately controls the rotating stage position.
Application
The differentially pumped rotary feedthrough can be combined with manipulators and any other precision positioning devices.
Additional information
The feedthroughs are equipped with worm drive providing fine angle adjustment. They are available with an anti-backlash stepper motor.
Different motors or motor control systems available (stepper motors, servomotors, IcePAP).
Base flange | DN 40CF, DN 63CF, DN 100CF, DN 160CF |
R1 rotation control | handwheel / stepper motor (option) |
Resolution (manual/motorised/external optical encoder) | 1° / 0.1° / 0.05° |
Bakeout temperature | up to 150 °C |
DIAMETER & DISTANCE BETWEEN FLANGES
Base flange | ID [mm] | distance L [mm] |
DN 40CF | 41 | 35.2 |
DN 63CF | 66 | 48 |
DN 100CF | 103 | 47 |
DN160CF | 153.1 | 44 |
The free flange moves towards the fixed flange in a controlled, precise motion whilst maintaining parallelism. Its action is similar to the Z slide manipulator, but with slightly reduced travel length and overall positioning resolution. The standard mounting flange is DN 40CF or DN 63CF. The shift is actuated by a handwheel and can work in any orientation.
Application
The linear shifts are used in applications that don’t require the higher precision and graduated movement of other linear motion devices. They are normally used for:
· manipulation of surface science tools with respect to the sample position
· manipulation of evaporation and sputter sources
· manipulation of electron and x-ray sources
· manipulation of quartz oscillators
· sample transfer applications
Additional information
The linear shifts are designed for the linear movement of instruments with minimum tilt or wobble in the movement, maintaining precision alignment before and after pump-down.
Base flange | DN 40CF or DN 63CF |
Travelling flange | DN 40CF |
Z range | 25, 50, 75, 100 of 150 mm |
Bellows ID | 38.5 mm |
Positional control | handwheel |
Resolution | 1 mm |
Repeatability | 1 mm |
Tilt range (for LS with tilt) | ± 4° |
Bakeout temperature | up to 150 °C |
COMPRESSED / EXTENDED LENGTH
Compressed length [mm] Extended length [mm] |
|||||||
Z range [mm] | standard | high stability | with tilt | ||||
DN 40/40CF | DN 63/40CF | DN 40/40CF double guided below |
DN 40/40CF | DN 63/40 CF | DN 40/40CF | DN 63/40CF | |
25 | 45 70 |
47.5 72.5 |
- - |
- - |
47.5 72.5 |
- - |
- - |
50 | 51 101 |
55 105 |
- - |
- - |
60.7 110.7 |
- - |
- - |
75 | 53 128 |
60 135 |
- - |
54.3 129.3 |
- - |
65 140 |
- - |
100 | 65 165 |
69 169 |
- - |
65 165 |
69 169 |
66 166 |
55 157 |
150 | - - |
- - |
80 230 |
- - |
- - |
- - |
- - |
The slide is provided through three lead screws which are synchronously driven by a drive chain. Manual operation is provided by a handwheel assembly operating through a wormdrive reduction system.
Application
The Z chain slides are heavy duty translators designed to move heavy objects accurately in and out of the vacuum system. They are well suited to applications involving equipment insertion and withdrawal from points where space is restricted.
Additional information
Z chain slides are often integrated with an XY stage. The unit is intended primarily for vertical operation with the load supported on the Z axis. For alternative orientations please contact our technical department. The Z chain slide can be motorised with the stepper motor shift.
Base flange | DN 100CF or DN 160CF* |
Travelling flange | DN 100CF or DN 100CF* |
Z range | 100 - 300 mm |
Z motion control | handwheel / stepper motor (option) |
resolution (manual/motorised) | 50 μm / standard 10 μm (1 μm on request) |
Bakeout temperature | up to 150 °C |
COMPRESSED / EXTENDED LENGTH
Compressed length [mm] Extended length [mm] |
||
Z range [mm] | Bellow ID102 DN 100/100CF |
Bellow ID156 DN 160/160CF |
100 | 104.5 204.5 |
96 196 |
200 | 125 325 |
122.5 322.5 |
300 | 141 441 |
150 450 |
It has interchangeable knives, fixed with four screws M3 and pressed using plates.
Mounting flange | DN 63CF (other on request) |
Z travel | 130 mm |
R2 angular range | ± 7° |
R3 angular range | ± 7° |
Blade width | 12 mm |
Bakeout temperature | up to 150 °C |
Non magnetic vacuum parts.
Mounting flange | DN 63CF (other on request) |
Z travel | 130 mm |
R2 angular range | ± 7° |
R3 angular range | ± 7° |
Blade width | 12 mm |
Bakeout temperature | up to 150 °C |
Custom shaft length and Z travel ranges are available on request.
Mounting flange | DN 40CF |
Z travel | 10 mm |
Angular range | ± 10° |
Bakeout temperature | up to 150 °C |
The modular construction means that the specification can be upgraded or modified by the addition to replacement of well defined modules.
Option
▪ Full motorisation
▪ Full software control
▪ Helium recovery system
▪ Possibility to mount an angular device for PES calibration
▪ Temperature stabilisation
▪ Heating option: direct, resistive or EB
Heating and cooling methods
Sample temperature depend on sample holder type:
▪ Direct heating with 10 A
▪ Resistive heating up to 1100 °C
▪ EB heating up to 1400 °C
▪ Liquid helium cooling:
- 4 axes manipulator - down to 4 K*
- 5 axes manipulator - down to 4.8 K* / 10 K**
- 6 axes manipulator - down to 7 K* / 15 K**
* parameters achieved without heating option and temp. stabilisation.
** parameters achieved with heating option.
Standard base flange | DN 100CF or DN 160CF |
Pressure range | down to 10-11 mbar |
Heating methods | resistive, EB, direct |
Cooling method | LHe |
XY range | ± 12.5 mm |
positional control | micrometer/motorised* |
resolution (manual/motorised) | 5 μm / 1 μm |
Z range | up to 600 mm |
positional control | handwheel/motorised* |
resolution (manual/motorised) | 1 mm / standard 10 μm (1 μm on request) |
R1 range | ± 180° or ± 360° |
positional control | rotary feedthrough/motorised* |
resolution (motorised) | 0.1° |
R2 range | 360° continuous |
positional control | motorised* |
resolution (motorised) | 0.1° |
R3 range | - 20° to +40° |
positional control | rotary feedthrough/motorised* |
resolution (motorised) | 0.1° |
Bakeout temperature | up to 150 °C |
* stepper motor or servomotor - depend on application.
Manipulator can be prepared for customer motors or drivers - on request.
The manipulator can be configured with Z slide, XY stage or differentially pumped rotary feedthrough. The modular construction means that the specification can be upgraded or modified by the addition or replacement of well defined modules. The standard mounting flange is DN 100CF. The system typically includes a compressor, high pressure hoses, expander, temperature controller, heater and sensor.
Option
▪ Full motorisation
▪ Full software control
▪ Helium recovery system
▪ Possibility to mount an angular device for PES calibration
▪ Additional electrical contacts for silicon sample direct heating
▪ Low vibration cryostat
▪ Temperature stabilisation
▪ Heating option: direct, resistive or EB
Heating and cooling methods
Sample temperature depend on sample holder type:
▪ EB heating - up to 1000 °C (second stage)
▪ Direct heating with 10 A
▪ Resistive heating (on request)
▪ Liquid helium cooling:
- below 10 K* (5-axes manipulator)
* parameters achieved without stabilisation and without heating option.
Standard base flange | DN 100CF or DN 160CF |
Pressure range | 1 bar to 10-11 mbar |
Heating methods | resistive, EB, direct |
Cooling method | LHe |
XY range | ± 12.5 mm* |
positional control | micrometer/motorised** |
resolution (manual/motorised) | 5 μm / 1 μm |
Z range | up to 300 mm |
positional control | handwheel/motorised** |
resolution (manual/motorised) | 50 μm / standard 10 μm (1 μm on request) |
R1 range | ± 180° |
positional control | rotary feedthrough/motorised** |
resolution (motorised) | 0.1° |
R2 range | 360° continuous |
positional control | motorised** |
resolution (motorised) | 0.1° |
R3 range | - 20° to +40° |
positional control | rotary feedthrough/motorised** |
resolution (motorised) | 0.1° |
Bakeout temperature | up to 150 °C |
* for base flange DN 160CF
** stepper motor or servomotor - depend on application.
Manipulator can be prepared for customer motors or drivers - on request.
The modular construction means that the specification can be upgraded or modified by the addition or replacement of well defined modules. All axes of the manipulator are motorised by stepper motors or servomotors. The X, Y and Z axes may also be operated manually by as required. The standard mounting flange is DN 100CF or DN 160CF. The 4-5 axes manipulator is a combination of XY stage, Z slide and rotation stages.
Option
▪ Full motorisation
▪ Full software control
▪ Temperature stabilisation
▪ Heating option: direct, resistive or EB
▪ Heaters suitable for reactive gases (resistive heating)
Additional infromation
The multi-axes manipulators are configured with a sample receiving station that can accept one of the PTS range of sample holders. The station is equipped with 6 electrical contacts (2 x thermocouple type K, C or E; 2 x sample bias up to 1000V, 2 x heating current up to 20A) and sapphire ball cooling contact for liquid nitrogen cooling. The manipulator includes all of the necessary electrical, gas and mechanical feedthroughs together with stepper motor and stepper motor driver for the XY, Z, R1 and R2 axes.
* 6 axes manipulator for PTS sample holders on request.
Standard base flange | DN 100CF or DN 160CF |
Pressure range | down to 10-11 mbar |
Heating methods | resistive, EB, direct |
Cooling method | LN2 |
XY range | ± 12.5 mm |
positional control | micrometer/motorised* |
resolution (manual/motorised) | 5 μm / 1 μm |
Z range | 75 - 800 mm (other on request) |
positional control | handwheel/motorised* |
resolution (manual/motorised) | 500 μm / standard 10 μm (1 μm on request) |
R1 range | ± 175° |
positional control | rotary feedthrough/motorised* |
resolution (motorised) | 0.1° |
R2 range | 360° continuous / ±90° |
positional control | motorised |
resolution (motorised) | 0.1° |
Bakeout temperature | up to 150 °C |
* stepper motor or servomotor - depend on application.
Manipulator can be prepared for customer motors or drivers - on request.
The manipulators can move sample in any of three orthogonal axes XYZ. Additional rotational movements around these axes (R1, R2, R3) can be achieved using add-on rotary devices. To achieve the highest positioning accuracy, resolution and repeatability, the XYZ manipulator and rotary drive movements can be motorised. Manipulators can work in any orientation.
Heating and cooling option
PTS and flag style range of sample holders dock with the receiving station on each manipulator. Samples are either resistively or electron-beam or direct current heated, depending upon the requirement. They are cooled by using a manipulator mounted cryostat through which liquid nitrogen (LN2) or liquid helium (LHe) flows.
It has additional uses such as e.g. a temporary storage or static preparation table when combined with a wobble stick.
Heating and cooling option
PTS and flag style range of sample holders dock with the receiving station on each manipulator. Samples are either resistively or electron-beam or direct current heated, depending upon the requirement. They are cooled by using a manipulator mounted cryostat through which liquid nitrogen (LN2) or liquid helium (LHe) flows.
The standard mounting flange is DN 63CF and the standard travelling flange is DN 40CF. All three axes are merged in one miniature stage that delivers outstanding performance at exceptionally low prices. The translators can work in any orientation.
Application
The XYZ mini manipulator has been designed for ease and convenience of use. X and Y movement is ± 12.5 mm, depending on the accessories that are fitted. Z movement is 75-250 mm, depending on the application.
Additional information
Only the Z movement can be motorised.
Base flange | DN 63CF or DN 100CF |
Travelling flange | DN 40CF |
XY range | ± 12.5 mm |
resolution | 5 μm |
Z range | 75 - 100 mm |
resolution (manual) | 0.5 mm |
Bakeout temperature | up to 150 °C |
Compressed / Extended Length
Compressed length [mm] Extended length [mm] |
|||
Z range [mm] | DN 40/40CF bellow ID39 |
DN63/40CF bellow ID39 |
DN100/40CF bellow ID39 |
75 | 179 254 |
179 254 |
179 254 |
100 | - | 179.5 279.5 |
179.5 279.5 |
The analyser is wrapped in a shield constructed of up to two parallel mu-metal plates guaranteeing adequate analysis conditions for low-and high-energy photoelectrons.
Equipped with a total number of 11 slits, the analyser offers the possibility to choose between best energy resolution and best intensity. According to given photoelectron energy the analyser is set up with up to 8 predefined PE to satisfy customer's requirements.
Detectors
• MCP-CCD detector
- 40 mm diameter dual MCP detector
- 656 energy channels available simultanously
- 494 angular channels available simultanously
- 90 fps
• 7-MCD detector
• DLD detector (on request)
Additional information
EA15 hemispherical energy analyser can be controlled directly by LabVIEW programming environment.
Note:
The use of a mu-metal analysis vacuum chamber or an inner mu-metal shielded chamber in combination with PREVAC EA15 hemispherical energy analyser is recommended in order to minimalize influence of external magnetic fields and to maximize performance of the analyser.
Mounting flange | DN 100 CF |
Bakeout temperature | up to 150 °C |
Working distance | 43 mm |
Analyser mean radius | 150 mm |
Pass energies XPS XPS/UPS & XPS/UPS/ARPES |
20, 50, 100, 200 eV 1, 2, 5, 10, 20, 50, 100, 200 eV |
Energy resolution XPS XPS/UPS & XPS/UPS/ARPES |
< 20 meV FWHM < 3 meV FWHM |
Kinetic energy range | 0.5 - 3000 eV |
Acquisition modes | fixed, scan |
Transmission and angular lens mode: ▫ lens acceptance angle (transmission mode) ▫ lens acceptance angle (angular mode) |
+/- 15° +/- 10° |
Maximum energy window in fixed mode | 12.5 % of pass energy (for MCP-CCD) |
Completely designed of non-magnetic materials |
The analyser is equipped with a total number of 11 slits and offers the possibility to choose between best energy resolution and best intensity. According to given photoelectron energy the analyser is set up with up to 8 predefined PE to satisfy customer's requirements.
Detectors
• MCP-CCD detector
- 40 mm diameter dual MCP detector
- 656 energy channels available simultanously
- 494 angular channels available simultanously
- 90 fps
• 7-MCD detector (for UHV)
• DLD detector (for UHV, on request)
Additional information
EA15 hemispherical energy analyser can be controlled directly by LabVIEW programming environment.
Note:
The use of a mu-metal analysis vacuum chamber or an inner mu-metal shielded chamber in combination with PREVAC EA15-HP1 hemispherical energy analyser is recommended in order to minimalize influence of external magnetic fields and to maximize performance of the analyser.
Mounting flange | DN 100 CF |
Bakeout temperature | up to 120 °C |
Working distance | 1-2 mm (dependent on cone opening) |
Analyser mean radius | 150 mm |
Pass energies XPS XPS/UPS & XPS/UPS/ARPES* |
20, 50, 100, 200 eV 1, 2, 5, 10, 20, 50, 100, 200 eV |
Energy resolution XPS XPS/UPS & XPS/UPS/ARPES* |
< 20 meV FWHM < 3 meV FWHM |
Kinetic energy range | 0.5 - 3000 eV |
Acquisition modes | fixed, scan |
Transmission and angular lens mode: ▫ lens acceptance angle (transmission mode) ▫ lens acceptance angle (angular mode) |
+/- 15° +/- 10° |
Maximum energy window in fixed mode | 12.5 % of pass energy (for MCP-CCD) |
Completely designed of non-magnetic materials |
*only in UHV conditions
The analyser is equipped with a total number of 11 slits and offers the possibility to choose between best energy resolution and best intensity. According to given photoelectron energy the analyser is set up with up to 9 predefined PE to satisfy customer's requirements.
Detectors
• MCP-CCD detector
- 40 mm diameter dual MCP detector
- 656 energy channels available simultanously
- 494 angular channels available simultanously
- 90 fps
• 7-MCD detector
Additional information
EA15 hemispherical energy analyser can be controlled directly by LabVIEW programming environment.
Note:
The use of a mu-metal analysis vacuum chamber or an inner mu-metal shielded chamber in combination with PREVAC EA15-HP50 hemispherical energy analyser is recommended in order to minimalize influence of external magnetic fields and to maximize performance of the analyser.
Mounting flange | DN 200 CF |
Bakeout temperature | up to 120 °C |
Working distance | 0.3-2 mm (dependent on cone opening) |
Analyser mean radius | 150 mm |
Pass energies | 5, 10, 20, 50, 100, 200, 250, 300, 500 eV |
Energy resolution XPS |
< 20 meV FWHM |
Kinetic energy range | 0.5 - 1500 eV |
Acquisition modes | fixed, scan |
Transmission and angular lens mode: ▫ lens acceptance angle (transmission mode) |
+/- 9° |
Maximum energy window in fixed mode | 12.5 % of pass energy (for MCP-CCD) |
Completely designed of non-magnetic materials |
Crystal mirror has been installed on special designed independent retraction, pitch, roll mechanism to precise adjustment working position and two halogen heaters controlled via PID regulator. The monochromator with a Rowland circle of 500mm diameter for a high X-ray energy resolution has a compact design with differential pumping ports and an optional polymer aluminized window can be installed to prevent from sputtering.
X-ray source based on redesigned dual anode source has been installed on three degrees of motion high precise manipulator. Source has two operate modes – high power up to 600W, and small spot for high spatial/energy resolution measurement.
High pressure versions are available:
RMC50 HP5 with working pressure range up to 5mbar
RMC50 HP50 with working pressure range up to 50mbar
Features
Mounting flange | DN 100 CF |
Crystal area | 200 mm x 100 mm |
Rowland circle diameter | 500 mm |
Chamber diameter | 310 mm |
Chamber port length | 220 mm |
X-ray source anodes | dual anode Al/Ag |
Modes | normal (non-focusing): 1 mm x 4 mm small spot (focusing): 1 mm x 2 mm |
Voltage | up to 15 kV |
Power | Al: 200 W (focusing), 450 W (non-focusing) Ag: 300 W (focusing), 600 W (non-focusing) |
Manipulator X/Y/Z range | ± 6.5 mm / ± 6.5 mm / 25 mm |
Differential pumping | yes |
Crystal heating | yes (with stabilisation) |
Shutter | option |
Bakeout temperature | up to 150 °C |
Weight (approx.) | 65 kg |
Working pressure |
UHV < 5x10-6 mbar HP5 < 5 mbar UHV < 50 mbar |
Design of the anode, filament and source housing guarantees maximum X-Ray intensity and very low crosstalk between the anode faces.
A specially configured nose cone allows maximum access to the sample. Twin anode used in standard source, allows for separated emission of two different characteristic X-radiation emission lines: Mg (1253 eV), Al (1487 eV) – other coating materials on request.
Mounting flange | DN 40CF (non-rotatable) |
Anode | Al/Mg (other materials on request) |
Power | Al 600 W / Mg 400 W |
Energy range | 7 - 15 keV |
Cathode current (Icath) | up to 2.5 A |
Emission current range (Ie) | 0 - 50 mA |
Cross talk | < 0.35 % |
Magnetic field at sample | below 0.5 μT |
Increased sample temperature | < 5 °C |
Cathode type | thoriated tungsten |
Water cooling | required, pressure 3.5 - 5 bar (max. 6 bar), flow ≥ 2.5 l/min., Tmax = 30 °C |
Insertion length | 285 mm; OD: 35 mm |
FWHM | dependent on working distance (e.g. 30 mm for distance 15 mm) |
Typical working distance | 5 - 30 mm (optimum 15 mm) |
Bakeout temperature | up to 250 °C |
Working pressure | < 5 x 10-6 mbar |
The UVS 40A2 is used in UPS (ultraviolet photoelectron spectroscopy) research. The UVS is water cooled for maximum stability and features fully interlocked safety circuitry. The discharge has a maximum photon intensity at a pressure of several mbar so dual differential pumping stages are employed in order to maintain the host chamber pressure. The UVS 40A2 is designed so that a continuous gas flow is maintained through the discharge region. This is a great advantage in maintaining the cleanliness of the discharge capillary and results in very long service intervals.
Mounting flange | DN 40 CF (non-rotatable) |
Gases | He, Ar (option: Kr, Xe, Ne) |
Photocurrent | 1 - 80 nA |
Photon flux | >1016 photons / s*sr |
He I / He II ratio | better than 3:1 |
Water cooling | required, pressure 2 - 3 bar (max. 6 bar), flow > 1.5 l/min, Tmax= 30 °C |
Port aligner | integral , +/- 4° |
Discharge current | 40 - 300 mA |
Beam divergence | small beam divergence: <1° |
Capillary I.D. | 1.5 mm (others on request) |
Insertion length | 220 mm (standard), other on request, OD: 9.5 mm |
FWHM | dependent on working distance (e.g. 1.2 mm for distance 10 mm) |
Typical working distance | 5 - 100 mm (optimum 5 - 50 mm) |
Bakeout temperature | up to 200 °C |
Working pressure | < 1 mbar |
PREVAC monochromated UV Source use Bragg diffraction to separate narrow band of light wavelengths. During crystal rotation user can find 4 different wavelengths of beam transferred to sample. It happens because each wavelength is reflected by crystal at different angle (Bragg reflection). So called ZERO ORDER beam – creates when monochromator crystal works similar as normal mirror – it reflects multiple wavelengths and gives highest intensitivity of transferred beam. That mode can be used when user does not need monochromated beam, but high intensitivity of UV radiation.
Appliciations
Features
Options
Mounting flange | DN 40 CF (non-rotatable) |
Photocurrent | 1 - 12 nA |
Discharge current | 40 - 300 mA |
Port aligner | integral , +/- 4° |
Retractable capillary - distance from focus point to port | 350 mm |
Capillary I.D. | 1.6 mm |
Insertion length | 345 mm with extended capillary 289 mm with inserted capillary |
Typical working distance | 5 mm |
Bakeout temperature | up to 150 °C |
Working pressure | < 1 mbar |
The source generates an ion current of >70 μA/cm2 (Argon) with Gaussian beam profile. The source insertion length is adaptable to individual requirements (between 62.5 mm - 384.5 mm, other on request).
Mounting flange | DN 40CF (non-rotatable) |
Energy range | 0.12 keV – 5 keV |
Current density | > 120 μA/cm2 (for distance 30 mm) |
Cathode type | yttrium oxide coated iridium filament |
Insertion length | min. 62.5 mm, other on request OD: max. 37 mm |
FWHM | dependent on ion energy and working distance (e.g. 3 mm for distance 30 mm) |
Typical working distance | 30 - 250 mm |
Bakeout temperature | up to 250°C |
Working pressure | 10-5 - 10-6 mbar |
The source is able to raster a 10 mm x 10 mm area of the surface at the recommended working distance. It is particularly suitable for depth profiling in XPS, ISS and SIMS. The source can be also used for sample surface cleaning.
Mounting flange | DN 40CF (rotatable) |
Gases | Ar and reactive gases (O2, H2 hydrocarbons with reduced lifetime) |
Energy range | 0.15 keV - 5 keV |
Scan area | 10 mm x 10 mm (for working distance of 23 mm) |
Current density | up to 4 mA / cm2 (for distance 23 mm) |
Beam current | > 1 μA (for distance 23 mm) |
Cathode type | yttrium oxide coated iridium filament |
Small cone angle | 50° |
Insertion length | 163 mm (standard) |
FWHM | dependent on working distance (e.g. < 150 μm for distance 23 mm) |
Typical working distance | 23 - 120 mm |
Bakeout temperature | 250 °C |
Working pressure | 10-8 mbar (with max beam current) |
Due to the high transmission of its Einzel-Lens, the ES 40C delivers a high electron beam current over a wide energy range. The ES 40C1 is designed for a stable and reliable operation in e.g. AES, scanning applications, imaging, EELS and electron pulse or desorption experiments (ESD).
Mounting flange | DN 40CF (rotatable) |
Energy range | 0 - 5 keV |
Sample current | up to 100 μA |
Scan area | 10 mm x 10 mm |
Shield | Cu or μ-metal |
Cathode type | thoriated tungsten |
Insertion length | min. 155.7 mm, (other on request) OD: 33.5 mm (μ-metal), 35 mm (Cu) |
FWHM | dependent on working distance, min. 120 µm (for distance 56 mm) |
Working distance | 23 mm - 150 mm (typical 75 mm) |
Bakeout temperature | up to 250 °C |
Working pressure | < 5×10-6 mbar |
e.g. mu-metal, copper.
Mounting flange | DN 40CF (non-rotatable) |
Energy range | 0.01 - 500 eV |
Sample current | up to 100 μA |
Cathode type | thoriated tungsten |
Shield | Cu or μ-metal |
Insertion length | min. 145 mm (others on request), OD: 33.6 mm (μ-metal), 35 mm (Cu) |
FWHM | depending on working distance (e.g. 10 mm for distance 30 mm) |
Typical working distance | 20-100 mm |
Bakeout temperature | up to 250°C |
Working pressure | < 5 × 10-6 mbar |
TPD involves heating a sample under UHV conditions and simultaneously measuring a number of desorbing gas species as a function of sample temperature. A custom designed conical sampling end piece ensures the best possible response to desorbing species.
Mounting flange | DN 40 CF (non-rotatable) |
Bakeout temperature | up to 150 °C |
Insertion length | 190 mm (other on request), OD: 36.8 mm |
Mass range | 1 to 300 amu |
Mass filter | quadrupole |
Detector type | electron multiplier (EM) |
Resolution | better than 0.5 amu |
Sensitivity | 2×10-4 A/Torr (FC), |
Minimum detectable partial pressure | 5×10-11 Torr (FC), 5×10-14 Torr (EM) |
Working pressure | < 10-4 Torr to UHV (FC) < 10-6 Torr to UHV (EM) |
It is typically mounted on a linear shift/z-stage to allow the filament to be positioned near to the substrate and includes a protection shield when in the standby position.
Readouts and full control (device status, Z-axis shift) are provided by dedicated software application and Ion Multi Gauge Controller. Application can be integrated with Synthesium - advanced deposition software tool.
Features
Options
Mounting flange | DN 63CF (non-rotatable) |
Measurement system | Bayard-Alpert ion gauge |
Measurement range | 10-3 to 2x10-11 Torr |
Linear stroke | 150 mm (other on request) |
Max. outer diameter | 63 mm |
Filament | dual filament, ytrium coated iridium |
Controller | 3 channel MG15 - communication interface: RS232/485, Ethernet, PROFINET (option - specify at order) |
Bakeout temperature | up to 200 °C |
The chambers are normally mounted at the centre of a series of chambers, acting as a central distribution hub for cluster tools.
Features
• standard or telescopic transferring arm
• by rotating only one rotary feedthrough you can move the transfer arm in and out, rotate the sample holder around the arm axis, rotate the mechanism between transfer ports and lock/unlock the sample holder.
• chamber body diameters from 550 to 1200 mm (can be customized)
• configured with TSP and transfer mechanism with rack-and-pinion rotary motion feedthrough
• time to transfer between two chambers < 45 sec. (manual mode) - fast transfer time allows cold samples to stay cold (temperature rise also depends on initial temperature and heat capacity)
• fast & reliable drop-proof transfer of hot & cold samples
• up to 8 transfer positions to other UHV chambers with automatic sample positioning
• guaranteed base pressure: 10-11 mbar range after 48h of bakeout. 10-10 mbar during transferring
• numerous viewports
• equipped with UHV connecting flanges and additional ports for future versatility
• can be equipped with application matched vacuum pumps to achieve the best pressure range (e.g. turbo, ion, getter or titanium sublimation pumps)
Application
The transportation and rotating mechanism of the RDC chamber provides repeatable and accurate sample transfer to other chambers. The radial distribution chamber mechanism is a development of the linear rack-and-pinion transporter, where a single ended rack-and-pinion is precisely rotated by a precision rotary drive until it is aligned in a preset position at a radial port. Once locked into position, the same rotary drive transfers the rack out through the port.
Options
• R1 axis rotation (90° left, 90° right, 180°). Rotation is independent for each port.
Sample holders
Radial Distribution Chamber design allows to transfer a wide range of various sample holders:
• PTS, flag style, puck style, deposition or special design holders up to 8”
• with heating by direct, indirect or e-beam methods up to 2000°C
• with high cooling efficiency down to 4.8 K (LHe)
• dedicated for e.g. quartz balance, Faraday cup, high pressure reactors, powder materials, IR spectroscopy and many others
Travelling flange | DN 63CF - DN 160CF |
Viewport flange | DN 160CF |
Chamber diameter | 550 - 1200 mm (other on request) |
Max transfer length Z | 395 - 904, depends on chamber diameter, transferring arm and sample holder type (other on request) |
Positional control | manual / semi-motorised (option) / motorised (option) |
Bakeout temperature | up to 150°C |
Transfer Length
Chamber diameter D [mm] | Maximum transfer length Z [mm] | |
for PTS (1") sample holders | for flag style sample holders | |
550 telescopic | 555 | 572 |
700 telescopic | 780 | 797 |
700 | 395 | 414 |
750 | 444 | 463 |
800 | 493 | 512 |
900 | 591 | 610 |
1000 | 689 | 708 |
1200 | 885 | 904 |
Up to 15 sample holders can be loaded and transferred via the dedicated sample holder trolley. The chamber is made of stainless steel and includes flanges for pump, viewports, gauges and valves. Guaranteed base pressure range 10-11 mbar after bakeout at 150 ºC.
Sample holders
A special transferring trolley is ready to contain up to 15 pcs of PTS or flag holders or 3 pcs of plate style holder.
Options
• R1 axis rotation (90° left, 90° right). Rotation is independent for each port.
Additional information
The movement of a special trolley is realized through linear magnetic drive and rail transfer inside tube. All motion elements: rotary feedthrough, drive belt with set of magnets, section motor, etc. are outside the vacuum in order to guarantee best vacuum performance and easy service. The trolley with 15 positions for sample holders is mounted in vertical position. The trolley switches its angular position in variable sections automatically, a solution which guarantees easy operation and smooth transferring into dedicated Radial Distribution Chamber. The linear motion is fully automatic, each section includes its own optical sensor and motor to guarantee completely independent movement of each section as well as high precision and full protection of the system. All motion elements are mounted outside the vacuum in order to guarantee the best vacuum performance and for ease of service. The fast entry load lock chamber mechanism is used for loading sample holder cassette.
The linear transfers are designed to transport sample holders/samples between chambers.
They are commonly used to transfer samples from load lock chambers to UHV system main chambers. The linear transfers are pumped by the system vacuum pump set or else with a dedicated pump set. The entire movement range of the transfer mechanism is via a rotary motion feedthrough. The range of the transfer movement is from 320 to 1600 mm.
There are two types of linear transfers available:
• 1 axis - with forward movement only
• 2 axes - with forward movement and continuous rotation around the movement axis
Options
• R1 axis rotation (90° left, 90° right, 180°). Rotation is independent for each port.
Two sided linear transfer - allows for transferring through linear transfer chamber in both directions. Chamber can be equipped with additional ports for connecting e.g. pump.
The range of the transfer movement is from 500 to 2000 mm.
Travelling flange | DN 63CF |
Max transfer length Z | 320 - 1600 mm, depends on chamber length and sample holder type (other on request) |
Positional control | manual / motorised (option) |
Bakeout temperature | up to 150°C |
Transfer Length
Maximum transfer length Z [mm] | Housing length L [mm] |
320 | 592 |
500 | 772 |
750 | 1022 |
1000 | 1272 |
1250 | 1522 |
1500 | 1772 |
1600 | 1872 |
Sample holders/samples can be stored and transported inside the transport box while maintaining UHV conditions. Vacuum is ensured by an ion pump and it's monitored by appropriate pressure gauge. The pump is designed so that it can be powered from e.g. a car battery or other power source.
Pumping options
• NEG Getter pump - pumping speed: 200 l/s (DN 40CF)
• ION pump - pumping speed: 3 l/s (DN 16CF)
Custom design
• Various types of sample holders - bespoke transport box designs to accommodate various types and styles of sample holder
• Portable infrared chamber - compact size, simple design vacuum box dedicated for FTIR spectroscopy investigations. Easy connection to IR spectrometer thanks to its portability
for PTS sample holders | for flag style sample holders | |
Weight | ≈ 7 kg (8 kg with power supply) | ≈ 13.5 kg (14.5 kg with power supply), depend on transferring length |
Pressure range (with pump) | down to 1×10-9 mbar | down to 1×10-10 mbar |
Mounting flange (transferring port) | PTS dedicated load lock connection port | DN 40CF |
Max. tranfer length | - | 130 - 215 mm (other on request) |
Storage | up to 2 sample holders | up to 6 sample holders |
The load lock chamber mechanisms combine with our range of load lock chambers to provide the most versatile sample loading conditions at various positions on the UHV system.
Additional information
Load locks may be positioned at various places on the UHV system, such as direct connection to the radial distribution chamber, linear transfer line or glovebox.
Our standard range of load lock chambers are suitable for most positions and most applications but we will also be happy to fabricate to your individual specifications.
Load lock chambers are typically equipped with:
• load lock chamber mechanism
• pump system
• viewports
• pressure gauges
The top port of the load lock chamber mechanism is usually sealed by a viton gasket. The chambers are equipped with UHV connecting flanges and additional ports for future versatility. They are designed for base pressures between 1x10-7 mbar and 1x10-9 mbar. A range of options exist for e.g. LN2 cooling or heating samples up to 600 °C.
The storage chamber mechanism combines with our range of storage chambers.
Additional information
Storage chambers are usually pumped via the distribution chamber pump set (independent pumping is also possible if requested) and may be equipped with options for cooling or heating. The heating and cooling facilities apply to the sample that is in the load position and depend upon the individual sample holder specifications. The chambers are equipped with UHV connecting flanges and additional ports for future versatility.
Additional information
Reorientation chambers are usually pumped via the distribution chamber pump set (independent pumping is also possible if requested). The chamber is equipped with several large viewports. Reorientation Chamber allows easy extension UHV system of every quantity of chambers.
Samples could be subject on static or flowing gas, with the heating up to 750°C and possibility of cooling down to -100°C (option).
Inside the vacuum chamber of the High Pressure Reactor is a system of cups which is a closed space in which a sample have contact with gases. Opening and closing the cups is done manually by turning a reaction volume screw. The sample mounting table can be made of stainless steel, titanium, gold or other materials/alloys, depending upon application. The temperature of sample holders is regulated by HEAT3-PS Power Supply.
Experiments with reactive gases at static or flow mode (temperature of gases up to 300°C) can be performed at pressure from 1 bar up to 20 bar (depends on the type of gas dosing system).
Options
• coldfinger for sample holder cooling
• laser heating for fast sample heating up to 900°C
• back pressure regulator – needed in case of experiments from 2 – 20 bar in flow mode. Dedicated gas manifold with proper flowmeters required
• heated outlet of the gases
• temperature control software (HEAT3-PS dedicated software) – full software control of temperature, ramp rate and output power
• reactor dedicated to work with CO and H2S – on request
• an additional measuring equipment, for example UMS to conduct spectrography and chromatography of the gas which is flowing out from the reactor
Special design
Special design allows for closing the whole PTS sample holder inside reactor cups, therefore there is only one sealing surface. This solution requires larger volume of gas.
Sample holders (wafers, molyblocs) dedicated for different deposition techniques, such as MBE, magnetron sputtering, thermal evaporation and others. Available in 2“, 3“, 4“ diameter size as standard (6“, 8“ and larger on request). The holder can be configured with adaptations for single and multiples of other types of sample holders, for example flag style plates. Standard material is molybdenum or titanium, other materials are available on request.
Commonly used sample holder for a wide range of applications. Available as a simple bare plate or configurations including; with 4x M2 screws for sample fixing, plate with pedestal or prepared for electron bombardment, resistive or direct current heating. The holder also can be equipped with a thermocouple for accurate sample temperature measurement. Available materials: titanium, molybdenum, copper, tantalum, aluminum.
The PTS 200 RES sample holder features a heated, rotating wire of 129mm L and 0.5mm dia (max) for vapor deposition experiments. The wire rotates around the longitudinal axis to ensure even deposition. The sample holder docks with a bespoke receiving station that is fully compatible with all other sample holders in the PTS range.
Vapor deposition experiments.
Temperature range up to 200˚C.
Sample heating is fully controlled via the HEAT3-PS PID regulated power supply.
The PTS Faraday Cup with extra capability Sample Holder has replaceable aperture plates. Aperture diameter options are:
The PTS FARA sample holder has integrated Faraday Cup with secondary electron suppressor for beam profile measurements.
Beam profile measurement.
The PTS QUARTZ sample holder is equipped with integrated quartz balance for deposition rate measurements. A key advantage is that all evaporators may be calibrated with the same quartz crystal. Additionally, the sample holder can measure rates in multiple chambers on multi-chamber UHV systems, removing the expense of having to mount separate quartz balances and Z translators on each chamber. It is compatible with the standard PTS receiving stations.
Evaporator calibration.
The PTS SPM 2000 EB/C-C sample holder is for SPM work and is equipped with electron beam sample heating up to 2000°C. Dedicated for Ø8mm or smaller single crystals with suitable mounting slits.
The PTS SPM Cleav sample holder combines sample cleaving capabilities with SPM compatibility over the temperature range -170°C to 600°C (indirectly heated).
Designed for Scanning Probe Microscopy.
Temperature Range: -170°C to 600°C
Integrated Cleaver Mechanism.
Thermocouple: To match exact configuration – all types possible.
Sample holder is supplied and regulated by HEAT3-PS Power Supply.
The main advantage of this pump is that it is simple, inexpensive and can produce high pumping speeds. The TSP consists of 3 removable hairpin shaped filaments. They are made from an alloy of Titanium and Molybdenum and are mounted in a simple carrier designed to have low electrical resistance. A high current, from an external power supply, is passed through the filament so that it glows red hot. At this temperature, titanium is sublimated directly from the filament. This sublimated evaporant then coats the nearby walls of the chamber.
▪ To increase pumping speed the TSP can be equipped with a Liquid Nitrogen Shield
▪ Can operate in any orientation
The thickness of both evaporated and sputter coated films can be monitored. The sensor head is a water cooled, non-magnetic housing which is permanently positioned in the vacuum system. The crystal face is parallel to the water cooling feedthrough pipes. The Quartz Balance QO 40A1 is mounted on a DN 40CF flange with two Ø6 pipes and Microdot S-50 coaxial connector. Customized insertion length 130 - 500 mm (other on request).
Custom insertion length 114 - 380 mm (other on request).
Mounting flange | DN 40CF (rotatable) |
Heater | W wire (tungsten) |
Temperature range | EF 1200 °C (~250 °C - 1200 °C) EF 1500 °C (~250 °C - 1500 °C, 1600 °C for degas) |
Temperature stability | ± 0.1°C |
Crucible type (option) | PBN, Al2O3, Quartz (other materials on request) |
Crucibles volume | 5cc |
Evaporated materials | All typical materials according to crucible type |
Thermocouple type | EF 1200 °C - type K EF 1500 °C - type C |
Degassing temp. | 1600 °C |
Water cooling (required) | water flow: > 0.5 l/min, temperature: 20 - 30 °C, max pressure: 6 bar |
Insertion length | min. 114mm (other on request) OD: 35 mm |
Spot size | Dependent on working distance |
Working distance | 100 - 150 mm |
Bakeout temperature | up to 250 °C |
Working pressure | < 10-5 mbar |
Custom insertion length min. 325 mm (other on request).
Mounting flange | DN 40CF (rotatable) |
Heater | W wire (tungsten) |
Temperature range | 100 °C - 1000 °C |
Temperature stability | ± 0.1°C |
Crucible type (option) | PBN, Al2O3, Quartz (other materials on request) |
Crucibles volume | 5cc (other volumes on request) |
Evaporated materials | High vapor pressure and organic materials (e.g. As, Sb, Ba, Bi, K, Li, Mg, Ca, CdSe) |
Thermocouple type | type K |
Degassing temp. | 1100 °C |
Water cooling (required) | water flow: > 0.5 l/min, temperature: 15 - 30 °C, max pressure: 6 bar |
Insertion length | min. 115 mm (other on request) OD: 35 mm |
Spot size | Dependent on working distance |
Working distance | 100 - 150 mm |
Bakeout temperature | up to 250 °C |
Working pressure | < 10-5 mbar |
Custom insertion length min. 325 mm (other on request).
Mounting flange | DN 40CF (rotatable) |
Heater | W wire (tungsten) |
Temperature range | 250 °C - 1400 °C |
Temperature stability | ± 0.1°C |
Crucible type (option) | PBN, Al2O3, Quartz (other materials on request) |
Crucibles volume | 5cc (other volume on request) |
Evaporated materials | Group III-V MBE all typical materials (e.g. Ga, In, Al, Si, Be, Cu, Ag, Au, CaF2) |
Thermocouple type | type C |
Degassing temp. | 1450 °C |
Water cooling (required) | water flow: > 0.5 l/min, temperature: 15 - 30 °C, max pressure: 6 bar |
Insertion length | min. 115 mm (other on request) OD: 35 mm |
Spot size | Dependent on working distance |
Working distance | 100 - 150 mm |
Bakeout temperature | up to 250 °C |
Working pressure | < 10-5 mbar |
The precisely defined evaporant beam means highly uniform deposition on the sample, the deposition area being determined by the distance from the E-beam evaporator to the sample and the choice of one of the easily exchangeable exit apertures. The electron beam evaporator EBV 40A1 is configured with choice of manual or automatic shutter. Custom insertion length 190 - 345 mm (other on request).
Features
Options
Mounting flange | DN 40CF (rotatable) |
Temperature range (for evaporated materials) | 160 °C – 2300 °C (3300 °C for molybdenum connector) |
Filament current | typically 1.8 - 2.2 A, max 2.3 A |
Evaporating rod diameter | 2 mm standard (other on request), step 2 mm, wire feed 25 mm wire length 43 mm |
Water cooling (required) | water flow: > 0.5 l/min., temperature: 20-30 °C, max pressure: 6 bar |
Exit aperture diameters | set 1: ID 4, ID 6, ID 7.4 (standard) set 2: ID 10, ID 14, ID 19 |
Type of shutter | manual or pneumatic |
Power | - 50 W for high vapor pressure materials - up to 200 W for crucibles and thick wires |
Energy range | 1 – 1500 eV |
Cathode type | thoriated tungsten |
Crucible type (option) | Knudsen cell type made from: Mo, W, liner PBN, Al2O3 |
Crucibles volume | 0.07 ml |
Evaporated materials | all typical materials according to crucible type |
Others | - flux regulation via ion current incl. electrode, feedthrough, display unit and PID-regulator - rear-loading evaporant |
Insertion length | min. 190 mm (other on request) OD: 34.8 mm |
Deposition area | dependent on working distance (e.g. 6 mm for distance 25 mm - ID 4, 33 mm for distance 75 mm - ID 19) |
Working distance | 25 - 75 mm (optimum) |
Bakeout temperature | up to 250°C |
Working pressure | <10-5 mbar |
The source is compatible with UHV conditions. Thanks to the integrated in situ tilt system, it can be used in both standard and custom geometry chambers. By using the dome type design we minimize the space needed to open the shutter. MS2 63C1 is fully compatible with our M600DC-PS power supply as well as all other DC, RF and pulsed DC power supplies available on the market.
Features
Options
Mounting flange | DN 63 CF * |
Max. power (DC mode) | 400 W DC ** |
Max. power (RF mode) | 400 W RF ** |
Max. voltage DC | 1200 V |
Connector DC/RF | type 7/16 |
Target form diameter thickness cooling |
circular 2" (50.8 mm) ± 0.2 mm 1 - 6 mm indirect |
Water flow | min. 1l/min |
Max. inlet water temperature | < 28 °C |
Max. water pressure | 3 bar |
Tubing diameter | Ø6×1 mm PTFE |
Magnet material | Neodymium Iron Boride (NdFeB) |
Magnet max. temperature | 200 °C |
Internal pneumatic shutter | yes - dome type shutter |
Insitu tilt module | yes, range +45° ÷ -10° |
Chimney | yes |
Typical rates Cu, 140 mm distance Ti, 140 mm distance |
45 nm/min @ 300 W 30 nm/min @ 300 W |
Internal gas inlet | yes (VCR standard) |
Working gas | Ar |
Max. working pressure | 5×10-3 - 1×10-1 mbar |
Optimal working pressure | 5×10-3 - 5×10-2 mbar |
* Other mounting flange on request (DN 100 CF, DN 160 CF).
** The maximum power is determined by the target material
The MS2 100 ISO-K Magnetron Source is used to apply thin layers with high homogeneity in the sputtering process.
The source is compatible with UHV conditions. By using the dome type design we minimize the space needed to open the shutter. MS2 100 ISO-K is fully compatible with our M600DC-PS power supply as well as all other DC, RF and pulsed DC power supplies available on the market. Design without tilt module.
Features
Options
Mounting flange | DN 100 ISO-K * |
Max. power (DC mode) | 400 W DC ** |
Max. power (RF mode) | 400 W RF ** |
Max. voltage DC | 1200 V |
Connector DC/RF | type 7/16 |
Target form diameter thickness cooling |
circular 2" (50.8 mm) ± 0.2 mm 1 - 6 mm indirect |
Water flow | min. 1l/min |
Max. inlet water temperature | < 28 °C |
Max. water pressure | 3 bar |
Tubing diameter | Ø6×1 mm PTFE |
Magnet material | Neodymium Iron Boride (NdFeB) |
Magnet max. temperature | 200 °C |
Internal pneumatic shutter | yes - dome type shutter |
Insitu tilt module | no |
Chimney | yes |
Typical rates Cu, 140 mm distance Ti, 140 mm distance |
45 nm/min @ 300 W 30 nm/min @ 300 W |
Internal gas inlet | yes (VCR standard) |
Working gas | Ar |
Max. working pressure | 5×10-3 - 1×10-1 mbar |
Optimal working pressure | 5×10-3 - 5×10-2 mbar |
* Other mounting flange on request.
** The maximum power is determined by the target material.